VESTA Technology, Inc. Unveils Series Of New Generation Of Atomic Layer Deposition Processing Equipment
San Jose, CA - VESTA Technology, Inc. introduced a series of new generation of ALD and vapor phase deposition (VPD) process for depositing both High-k films and metal films for semiconductor manufacturing in nano-technology applications for both 200mm and 300mm processing.
VESTA's IRIS(TM) Dielectric ALD System with advanced productivity can provide High-K solution for capacitor and gate dielectrics with sequential remote plasma anneal capability with integration of IRIS(TM) Plasma Anneal Process Module.
VESTA's VULCAN(TM) Metal ALD/VPD System can provide in-situ and/or sequential dual mode of ALD with VPD processing capability. VESTA's dual mode deposition technology integrates a precision ALD for initial layers with high throughput from various type of deposition obtained from gas phase of chemicals such as pseudo-ALD, pseudo-CVD, CVD, etc for bulk layers. Both the initial ALD layer and the VPD fill are deposited within the same VULCAN(TM) Process Module with or without plasma option.
The integration of in-situ and/or sequential deposition approach overcomes both the film quality limitation of CVD processing and the low deposition rate limitation of ALD processing. By adopting plasma technology, low temperature deposition is achieved for gate electrodes, back-end-of the line (BEOL) applications, and applications utilizing polymeric substrates.
"We are pleased with the latest addition to our ALD System product portfolio. Evolution of our core technology further strengthens and broadens our complete offering of Atomic Layer Deposition Process solutions," said Chuck Kim, executive director of VESTA Technology. "Through partnership with ATDF (Advanced Technology Development Facility), an independent subsidiary of SEMATECH Inc., our advanced R&D and Customer Demonstration facility enables VESTA Technology to continue to provide our customers with innovative and leading-edge technology solutions to address today's semiconductor device manufacturing challenges. Our complete ALD portfolio further positions VESTA Technology as a leading global supplier in our industry."
With the evolution of VESTA's ALD System, VESTA can provide complete ALD technology solution with technical flexibility of single wafer processing and the versatility of plasma capability for production requirement. VESTA's ALD System's success is due to its ability to offer revolutionary technology and proven production reliability with progressed developments for improved productivity performance.
SOURCE: VESTA Technology, Inc.